National Repository of Grey Literature 8 records found  Search took 0.01 seconds. 
Proceedings of the 4th Czech-Japan-China Cooperative Symposium on Nanostructure of Advanced Materials and Nanotechnology (CJCS’09)
Pokorná, Zuzana ; Mika, Filip
ISI ASCR in Brno is primarily a methodological institute creating and developing new experimental methods for several areas of physics, chemistry and biomedicine. Among these, methodology of the scanning electron microscopy occupies an important position. One of long time projects concerns microscopy with very slow electrons, much slower than what was for decades, until quite recently, available at the market of microscopes. Demonstration of new instrumental methods needs to have good partners in application areas, willing to enter unknown territories. On this basis, the collaboration between the University of Toyama and ISI in Brno exists and flourishes, producing plenty of common results and success stories.
Conjugated Silicon – Based Polymer Resists for Nanotechnologies: EB and UV Mediated Degradation Processes in Polysilanes
Schauer, F. ; Schauer, Petr ; Kuřitka, I. ; Hua, B.
The main purpose of this paper is to compare the photoluminescence (PL) and cathodoluminescence (CL) after major degradation, predominantly in long wavelength range 400 - 600 nm, studying the disorder due to dangling bonds, conformational transformations and weak bonds created by the degradation process.
Mapping the Local Density of States by Very Low Energy Scanning Electron Microscope
Pokorná, Zuzana ; Frank, Luděk
Single crystal and polycrystalline aluminium samples were imaged in the scanning low energy electron microscopes at energies of impinging electrons ranging between 0 and 90 eV. The integrated image signal at each energy was calculated and the resulting reflectance curves were compared to electron structure calculations. The influence of vacuum conditions and cleanliness of the substrate surface are discussed.
Orientation of Grains in the Al-Mg-Si-Mn Alloy by Scanning Low Energy Electron Microscopy
Müllerová, Ilona ; Matsuda, K. ; Horiba, K. ; Mikmeková, Šárka ; Frank, Luděk
Electron Backscatter Diffraction (EBSD) is a technique allowing the crystallographic infomiation to be obtained from samples in the scanning electron microscope (SEM). The main disadvantages of this method include the specimen tilt by 70°, requiring to operate at large working distances and hence with reduced lateral resolution, and a long acquisition time needed to obtain the full infomnation about grain orientations. However, the crystal orientation can be recognized upon energy dependence of the electron reflectance in the very low energy range. Information can be acquired at a high lateral resolution, high contrast and short acquisition time in a dedicated SEM equipped by the cathode lens.
Transmission of Electrons through Thin Films by Scanning Low Energy Electron Microscopy
Müllerová, Ilona ; Hovorka, Miloš ; Fořt, Tomáš ; Frank, Luděk
For examination of thin films by transmitted electrons (TE) the Transmission Electron Microscope is used at primary beam energies in hundreds of keV. The Scanning Electron Microscopes (SEM) utilize reflected electrons in order to image surfaces but recently the TE mode has been introduced into SEM at much lower electron energies.
Effect of the Matrix on Superconductive Characteristic of the MgB2 Composite Material
Mizutani, M. ; Matsuda, K. ; Ikeno, S. ; Nashimura, K. ; Müllerová, Ilona ; Frank, Luděk
We have used the original method of the three-dimensional penetration casting (3DPC) in the laboratory to fabricate the MgB2/Al composite. These samples were observed by the SLEEM to confirm the distribution of MgB2 particles in the Al-matrix.
Study of the Microstructure of the UFG Copper in UHV SLEEM
Mikmeková, Šárka ; Hovorka, Miloš ; Müllerová, Ilona ; Frank, Luděk ; Man, O. ; Pantělejev, L.
UHV SLEEM is an excellent method for observing grains in polycrystals thanks to much faster acquisition of data relative to EBSD. Specific energy dependences of the electron reflectance can be used for identifying the grain orientations.
Profiling of N-Type Dopants in Silicon Based Structures
Hovorka, Miloš ; Mika, Filip ; Frank, Luděk ; Mikulík, P.
We have focused on variously doped n-type pattems on a lightly doped p-type substrate because of lack of data for these structures. We have designed and prepared planar structures of this kind at the university clean room. Combination of the UHV SEM and PEEM microscooes should facilitate possible quantifying of the the doping levels in the n-type areas and explanation of their contrast with respect to the p-type substrate. In addition to the SEM observations at very low energies (down to the units of eV), we performed the laterally resolved threshold and soft X-ray spectroscopies in a PEEM equipped with an energy filter.

Interested in being notified about new results for this query?
Subscribe to the RSS feed.